SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Advanced x-ray mask inspection system (AXIS) using scanning electron microscopy for sub-70nm die-to-database inspections
Boerger, Brent E., Archie, Chas N., Yu, Mengchen, Selzer, Robert A., Ma, Yungsheng, Ronning, Donald, Ducharme, Donald, Grenon, Brian J., Trybendis, Michael J.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.659447
File:
PDF, 690 KB
english, 2006