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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Improving asymmetric printing and low margin using custom illumination for contact hole lithography
Jessen, Scott, Wong, Alfred K. K., Singh, Vivek K., Terry, Mark, Mason, Mark, O'Brien, Sean, Soper, Robert, Yarbrough, Willie, Wolf, ThomasVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.660120
File:
PDF, 3.64 MB
english, 2006