SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Synthesis of photobleachable deep UV resists based on single component nonchemically amplified resist system
Kim, Kyoung-Seon, Lin, Qinghuang, Kim, Su-Min, Park, Ji-Young, Kim, Jin-BaekVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.660634
File:
PDF, 378 KB
english, 2006