SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Mask repair using layout-based pattern copy for the 65-nm node and beyond
Boegli, Volker, Martin, Patrick M., Naber, Robert J., Auth, Nicole, Hofmann, UliVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.686404
File:
PDF, 1.73 MB
english, 2006