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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Three-dimensional X-ray lithography using a silicon mask with inclined absorbers
Mekaru, Harutaka, Lercel, Michael J., Takano, Takayuki, Awazu, Koichi, Takahashi, Masaharu, Maeda, RyutaroVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711824
File:
PDF, 411 KB
english, 2007