SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Feasibility of 37-nm half-pitch with ArF high-index immersion lithography
Sekine, Yoshiyuki, Flagello, Donis G., Kawashima, Miyoko, Sakamoto, Eiji, Sakai, Keita, Yamada, Akihiro, Honda, TokuyukiVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711940
File:
PDF, 393 KB
english, 2007