SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - High-resolution in-die metrology using beam profile reflectometry and ellipsometry
Jun, Chungsam, Archie, Chas N., Park, Jangik, Opsal, Jon, Pois, Heath, Kim, In-Kyo, Kim, Jung-Wook, Nicolaides, LenaVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712516
File:
PDF, 177 KB
english, 2007