SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Quantum state control interference lithography and trim double patterning for 32-16 nm lithography
Frankel, Robert D., Flagello, Donis G., Smith, Bruce W., Estroff, AndrewVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.717731
File:
PDF, 271 KB
english, 2007