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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask
Kang, Young-Min, Watanabe, Hidehiro, Kim, Sung-Jin, Park, Jin-Back, Chang, Wook, Park, Seung-Wook, Kim, Jai-Soon, Cho, Han-Koo, Oh, Hye-KeunVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728983
File:
PDF, 469 KB
english, 2007