SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - A new model of haze generation and storage-life-time estimation for mask
Shimada, S., Watanabe, Hidehiro, Kanda, N., Takahashi, N., Nakajima, H., Tanaka, H., Ishii, H., Shoji, Y., Ohtsuki, M., Naitoh, A., Hayashi, N.Volume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.729258
File:
PDF, 243 KB
english, 2007