SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Layout verification in the era of process uncertainty: requirements for speed, accuracy, and process portability
Torres, J. Andres, Naber, Robert J., Kawahira, Hiroichi, Graur, Ioana, Simmons, Mark C., Kanodia, SunitiVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746700
File:
PDF, 418 KB
english, 2007