SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Resist reflow process for arbitrary 32 nm node pattern
Henderson, Clifford L., Park, Joon-Min, An, Ilsin, Oh, Hye-KeunVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772130
File:
PDF, 4.22 MB
english, 2008