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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Minimizing linewidth roughness for 22-nm node patterning with step-and-flash imprint lithography
Schmid, Gerard M., Schellenberg, Frank M., Khusnatdinov, Niyaz, Brooks, Cynthia B., LaBrake, Dwayne, Thompson, Ecron, Resnick, Douglas J.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772956
File:
PDF, 1.69 MB
english, 2008