![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - EUV mask reflectivity measurements with micron-scale spatial resolution
Goldberg, Kenneth A., Schellenberg, Frank M., Rekawa, Senajith B., Kemp, Charles D., Barty, Anton, Anderson, Erik, Kearney, Patrick, Han, HakseungVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772971
File:
PDF, 1.38 MB
english, 2008