SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Study of the mask topography effect on the OPC modeling of hole patterns
Shim, Seong-bo, Kim, Young-chang, Lee, Suk-joo, Choi, Seong-woon, Han, Woo-sungVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.774025
File:
PDF, 409 KB
english, 2008