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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Modeling of charging effect and its correction by EB mask writer EBM-6000
Nakayamada, Noriaki, Horiuchi, Toshiyuki, Wake, Seiji, Kamikubo, Takashi, Sunaoshi, Hitoshi, Tamamushi, ShuichiVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793020
File:
PDF, 3.84 MB
english, 2008