SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Mask defect printability in the spacer patterning process
Miyoshi, Seiro, Kawahira, Hiroichi, Zurbrick, Larry S., Yamaguchi, Shinji, Hirano, Takashi, Mashita, Hiromitsu, Mukai, Hidefumi, Kobiki, Ayumi, Kobayashi, Yuuji, Hashimoto, Kohji, Inoue, SoichiVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801410
File:
PDF, 1000 KB
english, 2008