SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - A study of the limited area scanning system in the mask CD-SEM
Iwai, Toshi, Kawahira, Hiroichi, Zurbrick, Larry S., Shida, Soichi, Hiroyama, Mitsuo, Nakamura, Takayuki, Sakaguchi, Hisaya, Ueno, Hiroki, Higuchi, Masaru, Aihara, TatsuyaVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801418
File:
PDF, 570 KB
english, 2008