SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond
Naulleau, Patrick P., Schellenberg, Frank M., La Fontaine, Bruno M., Anderson, Christopher N., Baclea-an, Lorie-Mae, Denham, Paul, George, Simi, Goldberg, Kenneth A., Goldstein, Michael, Hoef, Brian,Volume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814232
File:
PDF, 2.61 MB
english, 2009