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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - KrF resists and process for implant layers at advanced nodes
Huang, Hung-Chin, Henderson, Clifford L., Huang, Yong-Fa, Wu, Steven, Jang, Louis, Lee, Sho-Shen, Huang, George K. C., Chen, Howard, Yu, Chun-Chi, Kurihara, Tomoki, Fukiya, Hitoshi, Yoshida, Hiromu, YVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.816136
File:
PDF, 1.00 MB
english, 2009