SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - In-die mask registration metrology for 32nm node DPT lithography
Roeth, Klaus-Dieter, Hosono, Kunihiro, Laske, Frank, Heiden, Michael, Adam, Dieter, Boesser, Artur, Rinn, Klaus, Schepp, André, Bender, JochenVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824282
File:
PDF, 546 KB
english, 2009