SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Defect printability analysis by lithographic simulation from high resolution mask images
Chen, George, Zurbrick, Larry S., Montgomery, M. Warren, Wiley, James N., Wang, Jen-Shiang, Howell, Rafael C., Bai, Shufeng, Chen, Yi-Fan, Chen, Frank, Cao, Yu, Takigawa, Tadahiro, Saito, Yasuko, KuroVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.831475
File:
PDF, 626 KB
english, 2009