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SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Electron beam inspection methods for imprint lithography at 32 nm
Selinidis, Kosta, Behringer, Uwe F. W., Thompson, Ecron, Sreenivasan, S. V., Resnick, Douglas J.Volume:
7470
Year:
2009
Language:
english
DOI:
10.1117/12.835180
File:
PDF, 1.62 MB
english, 2009