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SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Comparison of simulation and wafer results for shadowing and flare effect on EUV alpha demo tool
Moon, James, Chen, Alek C., Han, Woo-Sung, Kim, Cheol-Kyun, Nam, Byoung-Sub, Lin, Burn J., Yen, Anthony, Nam, Byong-Ho, Lim, Chang-Moon, Yim, Donggyu, Park, Sung-KiVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837136
File:
PDF, 8.02 MB
english, 2009