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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - OMOG mask topography effect on lithography modeling of 32nm contact hole patterning
Yuan, Lei, Dusa, Mircea V., Conley, Will, Zhou, Wenzhan, Zhuang, Larry L., Yoon, Kwang Sub, Lin, Qun Ying, Mansfield, ScottVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846547
File:
PDF, 666 KB
english, 2010