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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Detection of OPC conflict edges through MEEF analysis
Chang, Li-Fu, Rieger, Michael L., Thiele, Joerg, Choi, Chang-Il, Cheng, Guojie, Vikram, Abhishek, Zhang, Gary, Su, BoVolume:
7641
Year:
2010
Language:
english
DOI:
10.1117/12.846673
File:
PDF, 550 KB
english, 2010