SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Methods to explore and prevent pattern collapse in thin film lithography
Noga, David E., Allen, Robert D., Yeh, Wei-Ming, Lawson, Richard A., Tolbert, Laren M., Henderson, Clifford L.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.848423
File:
PDF, 1.11 MB
english, 2010