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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Future application of e-beam repair tool beyond 3X generation
Kanamitsu, Shingo, Hosono, Kunihiro, Hirano, TakashiVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.864098
File:
PDF, 1.50 MB
english, 2010