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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - New critical dimension uniformity measurement concept based reticle inspection tool
Seo, Kangjoon, Hosono, Kunihiro, Kim, MunSik, Kim, Sang Chul, Shin, JaeCheon, Kim, ChangYeol, Miller, John, Dayal, Aditya, Hutchinson, Trent, Park, KiHunVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.864109
File:
PDF, 1.85 MB
english, 2010