SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - A hybrid model/pattern based OPC approach for improved consistency and TAT

Desouky, Tamer, Conley, Will
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Volume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.914696
File:
PDF, 940 KB
english, 2012
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