SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Characteristics analysis of RELACS process from an OPC point of view
Choi, Jinyoung, Yoo, Minae, Park, Chanha, Oh, Changil, Kim, Cheolkyun, Yang, Hyunjo, Yim, Donggyu, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916121
File:
PDF, 1.44 MB
english, 2012