SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - Patterning of CMOS device structures for 40-80nm pitches and beyond
Engelmann, S. U., Zhang, Ying, Martin, R., Bruce, R. L., Miyazoe, H., Fuller, N. C. M., Graham, W. S., Sikorski, E. M., Glodde, M., Brink, M., Tsai, H., Bucchignano, J., Klaus, D., Kratschmer, E., GuiVolume:
8328
Year:
2012
Language:
english
DOI:
10.1117/12.916447
File:
PDF, 10.98 MB
english, 2012
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