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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Process development using negative tone development for the dark field critical layers in a 28nm node process
Versluijs, Janko, Truffert, Vincent, Murdoch, Gayle, De Bisschop, Peter, Trivkovic, Darko, Wiaux, Vincent, Kunnen, Eddy, Souriau, Laurent, Demuynck, Steven, Ercken, Monique, Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.916700
File:
PDF, 18.93 MB
english, 2012