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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - A comparison of alignment and overlay performance with varying hardmask materials
Yun, Sangho, Starikov, Alexander, Ha, Soon Mok, Nam, Young Min, Kim, Cheol-Hong, Nam, Suk-WooVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.917412
File:
PDF, 1.85 MB
english, 2012