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SPIE Proceedings [SPIE 1986 International Symposium/Innsbruck - Innsbruck, Austria (Tuesday 15 April 1986)] Optical System Design, Analysis, Production for Advanced Technology Systems - A Four Electrode Electrostatic Lens With Small Chromatic And Spherical Aberrations Used In Submicron Lithography
Jie, Gao, Jiahe, Tian, Keli, Wang, Huayi, Chang, Fischer, Robert E., Rogers, Philip J.Volume:
655
Year:
1986
Language:
english
DOI:
10.1117/12.938451
File:
PDF, 263 KB
english, 1986