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SPIE Proceedings [SPIE 1984 Microlithography Conferences - Santa Clara (Monday 12 March 1984)] Advances in Resist Technology I - Trilayer Resist Processing Using Spin-On Glass Intermediate Layers
Gupta, Satish K., Audain, Carver G., Willson, C. GrantVolume:
469
Year:
1984
Language:
english
DOI:
10.1117/12.941792
File:
PDF, 14.18 MB
english, 1984