SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Advances in Resist Technology and Processing II - A Series Of Azide-Phenolic Resin Resists For The Range Of Deep UV To Visible Light
Koibuchi, Shigeru, Isobe, Asao, Makino, Daisuke, Iwayanagi, Takao, Hashimoto, Michiaki, Nonogaki, Saburo, Thompson, Larry F.Volume:
539
Year:
1985
Language:
english
DOI:
10.1117/12.947832
File:
PDF, 9.49 MB
english, 1985