SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - Preparation And Lithographic Properties Of Poly(Trimethylsilylmethyl Methacrylate-Co-Chloromethyl Styrene)
Novembre, Anthony E., Reichmanis, Elsa, Davis, Myrtle, Willson, C. GrantVolume:
631
Year:
1986
Language:
english
DOI:
10.1117/12.963620
File:
PDF, 2.34 MB
english, 1986