SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - A Quantitative Assessment Of Image Reversal, A Candidate For A Submicron Process With Improved Linewidth Control
Gijsen, Rupert M., Kroon, Hennie J., Vollenbroek, Frans A., Vervoordeldonk, Rene, Willson, C. GrantVolume:
631
Year:
1986
Language:
english
DOI:
10.1117/12.963632
File:
PDF, 13.68 MB
english, 1986