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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Masks data preparation flow for advanced technology nodes
Marques, Antonio, Miramond, Corinne, Ndiaye, Omar, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.978290
File:
PDF, 941 KB
english, 2012