Atomic Layer Deposition of Silicon Nitride from...

Chemistry of Materials 2016 / 07

Atomic Layer Deposition of Silicon Nitride from Bis(Tertiary-Butyl-Amino)Silane and N 2 Plasma Studied by in situ Gas Phase and Surface Infrared Spectroscopy

Bosch, Roger H.E.C., Cornelissen, Lidewij E., Knoops, Harm C.M., Kessels, Wilhelmus (Erwin) M.M
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Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.6b02319
Date:
July, 2016
File:
PDF, 1.34 MB
english, 2016
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