SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Tuesday 18 October 1994)] Microelectronics Technology and Process Integration - Characterization of a high-quality and UV-transparent PECVD silicon nitride film for nonvolatile memory applications
Wang, Chin K., Ying, T. L., Wei, C. S., Liu, L. M., Cheng, Huang-Chung, Lin, M. S., Chen, Fusen E., Murarka, Shyam P.Volume:
2335
Year:
1994
Language:
english
DOI:
10.1117/12.186067
File:
PDF, 445 KB
english, 1994