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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Model-based pattern dummy generation for logic devices
Lai, Kafai, Erdmann, Andreas, Jang, Jongwon, Kim, Cheolkyun, Ko, Sungwoo, Byun, Seokyoung, Yang, Hyunjo, Yim, DonggyuVolume:
9052
Year:
2014
Language:
english
DOI:
10.1117/12.2046198
File:
PDF, 921 KB
english, 2014