SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Cycle-time reduction of CD targeting using automated metrology and analysis
Elliott, Richard C., Hershey, Robert R., Kemp, Kevin G., Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209214
File:
PDF, 229 KB
english, 1995