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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Contrast-boosted resist using a polarity-change reaction during aqueous base development
Uchino, Shou-ichi, Ueno, Takumi, Migitaka, Sonoko, Yamamoto, Jiro, Tanaka, Toshihiko P., Murai, Fumio, Shiraishi, Hiroshi, Hashimoto, Michiaki, Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241842
File:
PDF, 700 KB
english, 1996