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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Minimization of DUV multi-interference effect in 0.25-μm device fabrication
Kim, Ju-Hwan, Moon, Seung-Chan, Ko, Bong-Sang, Park, Hee K., Lee, Tae-Gook, Shin, Ki-Soo, Kim, Daehee, Fuller, Gene E.Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276018
File:
PDF, 1.28 MB
english, 1997