SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Lithography on flexible substrates: a roll-to-roll high-throughput high-resolution system for low-cost production of microelectronics
Jain, Kanti, Dunn, Thomas J., Farmiga, Nestor, Zemel, Mark, Weisbecker, Carl, Lee, Teik-Meng, Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309574
File:
PDF, 358 KB
english, 1998