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SPIE Proceedings [SPIE 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich, Germany (Monday 16 November 1998)] 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 - Manufacturing an advanced process characterization reticle incorporating halftone biasing
Nakagawa, Kent H., Van Den Broeke, Douglas J., Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Behringer, Uwe F. W.Volume:
3665
Year:
1999
Language:
english
DOI:
10.1117/12.346215
File:
PDF, 1.15 MB
english, 1999