SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts
Schriever, Guido, Rahe, Manfred, Neff, Willi, Bergmann, Klaus, Lebert, Rainer, Lauth, Hans, Basting, Dirk, Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390051
File:
PDF, 667 KB
english, 2000