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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Organic BARC process evaluation for via first dual-damascene patterning
Tan, Cher-Huan, Mukherjee-Roy, Moitreyee, Jo, Woo-Min, Kumar, Rakesh, Foo, Pang Dow, Sathappan, Santhanesh, Ngooi, Siew W., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436913
File:
PDF, 1.45 MB
english, 2001